PVA Sponge

Polyvinyl alcohol foam: a hydrophilic open-cell sponge with an apparent density of about 60–180 kg/m³ and pores from about 60 to 500 µm. It takes up about 5–12 times its dry weight in water. Dry, it is stiff; wet, it becomes soft and supple, and it is used wet.

In our range: semiconductor wafer PVA cleaning rollers, precision wafer and semiconductor brushes, ceramic substrate cleaning rollers, etching line brushes, glass washing machine rollers and sponge cleaning brushes. These are surfaces where any scratch or particle matters.

Because it touches the whole surface at once with very low pressure, carries water and cleaning liquid across it, and lifts particles into its pores instead of dragging them. On wafers and substrates, that removes particles without micro-scratching. It also wipes water off evenly, so it is used as a drying roller.

It depends on the grade, pore structure and roller build. The cited PVA roller maker gives 0–60°C in wet service, and data quote up to about 80°C for some grades. Confirm the exact sponge and roller for hot water or heated processes.

Wet. A PVA roller that dries out goes hard and can crack, and particles dried into it scratch the next part. Keep it conditioned and clean, follow the roller maker’s storage instructions, and replace it when the surface is damaged or will not rinse clean.

The surface, the process liquid and temperature, roller or head dimensions and core, pore size or softness if known, and the cleanliness requirement.